Shanghai Herch Tech Drives Innovation with 12-Inch N-Type Epitaxy Development
Shanghai Herch Tech, a leading player in the semiconductor industry, recently held its 2024 half-year and third-quarter earnings conference. The company highlighted its efforts to navigate market challenges while accelerating technological advancements in the development of 12-inch N-type epitaxial wafers and new customer acquisition.
Shanghai Herch Tech, a leading player in the semiconductor industry, recently held its 2024 half-year and third-quarter earnings conference. The company highlighted its efforts to navigate market challenges while accelerating technological advancements in the development of 12-inch N-type epitaxial wafers and new customer acquisition.
Overcoming Market Challenges
During the conference, CEO Chen Jiangang acknowledged the challenges faced in the first quarter of 2024 due to the semiconductor market downturn. Declines in sales volumes and prices, coupled with low capacity utilization, resulted in reduced revenue and increased costs. However, Herch Tech reported sequential improvements in production volumes and profitability starting from the second quarter, with continued upward trends into the third quarter.
Strategic Focus on 12-Inch and 8-Inch Technologies
To strengthen its market position, Herch Tech has set ambitious goals:
8-Inch Leadership: The company aims to integrate advanced 12-inch technology into its 8-inch production lines to enhance differentiation and competitiveness.
12-Inch Expansion: Accelerating the growth of its 12-inch production capabilities, Herch Tech is focused on capturing opportunities in the domestic Chinese market, with an emphasis on high-end semiconductor localization.
Herch Tech’s commitment to cost optimization through local manufacturing strategies and enhanced operational efficiencies is expected to attract more orders and strengthen its market presence.
Technological Innovation in Epitaxial Wafers
The company is making significant progress in:
12-Inch N-Type Epitaxy: Accelerating the development of integrated epitaxy solutions and customer-specific product offerings.
P-Type Epitaxy Demonstration Line: Establishing a state-of-the-art 12-inch P-type epitaxy demonstration line.
Advanced Process Nodes: Scaling production of 12-inch 55nm CIS epitaxial wafers and advancing R&D for 28nm P/P- epitaxial solutions.
These initiatives align with the company’s goal to drive innovation while supporting China’s push for semiconductor self-reliance and high-end technological advancements.
Looking Ahead
Shanghai Herch Tech's strategic focus on expanding its 12-inch capabilities and leveraging localized production aligns with global trends in the semiconductor industry. The company’s commitment to technological innovation and market adaptation positions it to capture a larger share of the growing semiconductor market, especially as demand for advanced process nodes continues to rise.








