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DENSO and Fuji Electric Announce $1.4 Billion Joint SiC Semiconductor ProjectNews

DENSO and Fuji Electric Announce $1.4 Billion Joint SiC Semiconductor Project

On November 29, 2024, DENSO Corporation and Fuji Electric Co., Ltd. announced a joint investment of approximately ¥211.6 billion (around $1.4 billion) to enhance Japan's silicon carbide (SiC) power semiconductor production capacity. This initiative has received approval from Japan's Ministry of Economy, Trade and Industry (METI), which will provide up to ¥70.5 billion in subsidies to support the project.  

Shaoxin and Xinrui Establish Joint Lab for Wafer-Level Bonding Equipment and MaterialsNews

Shaoxin and Xinrui Establish Joint Lab for Wafer-Level Bonding Equipment and Materials

On November 26, 2024, Suzhou Xinrui Technology Co., Ltd. (Xinrui) and Shaoxin Laboratory officially signed a cooperation agreement to establish the "Wafer-Level Bonding Equipment and Materials Joint Laboratory." This milestone partnership marks the start of deep collaboration between the two entities, aiming to drive technological advancements and innovation in the semiconductor industry.

Designing a Wearable Heart Rate Monitor

Designing a Wearable Heart Rate Monitor

In recent years, wearable devices have seen explosive growth in various markets, especially in fitness tracking and medical monitoring, due to the convenience and real-time data feedback they offer. Devices like Samsung's Gear Fit 2, Qardio®Arm blood pressure monitor, and Under Armor's UA SpeedForm® Gemini 3 smart shoes provide users with vital health information such as sleep quality, activity levels, and walking or running pace.

 Breakthrough EUV Lithography Technology Surpasses Semiconductor Manufacturing StandardsNews

Breakthrough EUV Lithography Technology Surpasses Semiconductor Manufacturing Standards

According to a recent report from the Okinawa Institute of Science and Technology Graduate University (OIST) published on their website, a new extreme ultraviolet (EUV) lithography technology has been developed, surpassing the existing standards in semiconductor manufacturing. This innovative design enables the lithography equipment to utilize a smaller EUV light source, consuming less than one-tenth of the power of traditional EUV lithography machines. This advancement not only reduces costs but also significantly enhances the reliability and lifespan of the machines.